Silicon(IV) oxide sputtering target, 50.8mm (2.0 in.) dia. x 6.35mm (0.250 in.) thick CAS
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- Time:2024-08-20
Product Details
- Product NameSilicon(IV) oxide sputtering target, 50.8mm (2.0 in.) dia. x 6.35mm (0.250 in.) thick
- EINECS No.272-697-1
- MFC6H19NO2Si3
- MW221.48
- Appearancetablets (~0.5 g each)White with some blue indicating granules
- storage temp. 2-8°C
- Boiling point >100 °C(lit.)
- Melting point 1610 °C(lit.)
- density 2.6 g/mL at 25 °C(lit.)
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