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HomecompanySilicon(II) oxide sputtering target, 50.8mm (2.0 in.) dia. x 6.35mm (0.250 in.) thick CAS 10097-28-6
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Silicon(II) oxide sputtering target, 50.8mm (2.0 in.) dia. x 6.35mm (0.250 in.) thick CAS 10097-28-6

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  • Time:2024-08-20

Product Details

  • Product NameSilicon(II) oxide sputtering target, 50.8mm (2.0 in.) dia. x 6.35mm (0.250 in.) thick
  • CAS No.10097-28-6
  • EINECS No.233-232-8
  • MFOSi
  • MW44.09
  • InChIKeyLIVNPJMFVYWSIS-UHFFFAOYSA-N
  • AppearancepowderBlack
  • density 2.13 g/mL at 25 °C (lit.)
  • Boiling point 1880°C
  • Melting point 1870 °C
  • Water Solubility Insoluble in water.

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